Abstract
<jats:p>Colloidal atomic layer deposition (c-ALD) has emerged as a powerful technique for enhancing the functional properties of nanocrystals (NCs) while preserving their solution dispersibility. Previous studies have shown that the deposition of amorphous metal oxide shells via c-ALD can passivate surface states in NCs, resulting in improved stability, photoluminescence, conductivity, and energy transfer. However, its application to doped metal oxide NCs—such as tin-doped indium oxide (ITO), which exhibit surface depletion due to surface hydroxyls, remains unexplored. In this work, we implement a c-ALD strategy using ligand-modified precursors to grow amorphous Al2O3, TiO2, and Ga2O3 shells on ITO NCs. We reveal how these coatings influence the plasmonic response and mitigate surface depletion, which we ascribe to surface state passivation.</jats:p>